Version française

Université de Nantes actively participates in the Eiffel Excellence Scholarship Program, a program established by the French Ministry of Europe and Foreign Affairs, and managed by Campus France. The Eiffel Excellence Scholarship Program permits French higher education institutions to welcome the best and brightest foreign students in their PhD Programs.

For a PhD program, the Eiffel Scholarship is granted for a maximum period of 12 months, that can be split over 3 calendar years.

For further information, please read the vade-mecum.

Eligibility

1 - Foreign students only ;
2 - No older than 35 years old during the 2019 call for applications ; born after March 1983 ;
3 - Not having another scholarship from the French government ;
4 - First time Eiffel PhD scholarship applicants only (previous PhD applicants are not eligible, but students who have already been awarded an Eiffel scholarship for a Master's degree program are eligible to apply for the PhD scholarship) ;
5 - Joint supervision or dual enrolment in partnership with a foreign higher education establishment ;
6 - Sufficient language skills ;
7 - Eligible PhD program (see list of eligible fields of study).

Fields of Study

  • Sciences in the broadest sense (engineering sciences; exact sciences: mathematics, physics, chemistry, life sciences, nano and biotechnology, earth sciences, sciences of the universe, environmental sciences, information and communication sciences and technology);
  • Economics and Management
  • Law
  • Political Sciences

PhD programs

Deadlines and application procedure

If you satisfy the eligibility requirements above and you wish to apply for the Eiffel scholarship for your PhD program under joint supervision or dual enrolment at université de Nantes, please contact the International Relations Office for more information.
 
Deadline to submit applications for the Eiffel scholarship for a PhD program at Université de Nantes: December 7th, 2018
 
Final results piblished by Campus France : the week of March 25th, 2019